한양대학교 나노바이오 전자재료 및 공정 연구실 - NEMPL

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연구업적

  • 총논문수 : 20
2012년
Heon-Yul Ryu, Hyeon-Seung Im, Si-Hyeong Cho, Byeong-Jun Hwang, Sung-Ho Lee, and Jin-Goo Park A Study of the Effect of Current Density Distribution in Electrochemical Etching Process for Metal Mold Fabrication by Experiment and Numerical Method The 25th International Microprocesses and Nanotechnology Conference(MNC), October 30 - November 2 (2012), Kobe, Japan
Hassan Hafeez, Si-Hyeong Cho, Dong-Ho Han, Young-Gil Seo, and Jin-Goo Park A Simple and Effective One Step Transfer Method of Hydrophobic Surface on Polyester Fabric The 25th International Microprocesses and Nanotechnology Conference(MNC), October 30 - November 2 (2012), Kobe, Japan
Si-Hyeong Cho, Ju-Kyung Lee, Jung-Hwan Lee, HeaYeon Lee, and Jin-Goo Park Development of Wafer-Level Fabrication Process for SiO2 based Nanowell Array Chip and Its Characterization The 25th International Microprocesses and Nanotechnology Conference(MNC), October 30 - November 2 (2012), Kobe, Japan
Min-Su Kim, Bong-Kyun Kang, Jung-Soo Lim, Ji-Hyun Jeong, Jae-Kwan Kim, Byung-Kyu Lee, and Jin-Goo Park Development of Cleaning Process for UV cured Resin Removal on Quartz substrate for Nanoimprint Lithography The 25th International Microprocesses and Nanotechnology Conference(MNC), October 30 - November 2 (2012), Kobe, Japan
Ahmed Busnaina, Pegah Karimi, Jingoo Park, Bongkyun Kang Non Destructive Nanoparticle Removal from Submicron Structures Using Megasonic Cleaning 11th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 16 - 19 (2012), Ghent, Belgium
Tae-Young Kwon, Manivannan Ramachandran, Byoung-Jun Cho, Ahmed A. Busnain, Jin-Goo Park The Impact of Diamond Conditioners on Scratch Formation during Silicon-dioxide CMP 22th Advanced Metallization Conference(ADMETA), October 22 - 25 (2012), Tokyo, Japan ADMETA2012 태영 초록.pdf
Byoung-Jun Cho, R. Prasanna Venkatesh, Tae-Young Kwon and Jin-Goo Park Modification of Diamond Conditioner with V-SAM Coatings for Corrosion Prevention during Metal CMP 22th Advanced Metallization Conference(ADMETA), October 22 - 25 (2012), Tokyo, Japan ADMETA2012 병준 초록.pdf
Manivannan Ramachandran, Byoung-Jun Cho, Tae-Young Kwon and Jin-Goo Park Hybrid Cleaning Technology for Enhanced Post-Cu/low-k CMP Cleaning erformance 22th Advanced Metallization Conference(ADMETA), October 22 - 25 (2012), Tokyo, Japan ADMETA2012 Mani Abstract.pdf
Tae-Young Kwon, Byoung-Jun Cho, R. Prasanna Venkatesh, and Jin-Goo Park Correlation of Polishing Pad Property and Pad Debris on Scratch Formation during CMP International conference on Planarization/CMP Technology (ICPT) 2012, October 15 - 17 (2012), Grenoble, France 15-17 October 2012 ICPT (Tae-Young Kwon).pdf.pdf
Hyuk-Min Kim, R. Manivannan, Deog-Ju Moon, Tae-Young Kwon, Jin-Hyeong Noh, Jin-Goo Park Evaluation of Glass Lapping Using Fixed Abrasive Pad International conference on Planarization/CMP Technology (ICPT) 2012, October 15 - 17 (2012), Grenoble, France 15-17 October 2012 ICPT (Hyuk-Min Kim).pdf
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